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晶圆边缘的缺陷挑战为何越来越突出
晶圆背面最常见的缺陷之一是热点。在深紫外或极紫外光刻过程中,背面颗粒会在图案化过程中改变焦深。此外,背面缺陷还可能导致蚀刻和离子注入过程中的工艺不均匀。在极端情况下,当晶圆在静电吸盘上被拉平时,背面颗粒还可能导致晶圆破损。
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