It is concluded that silicon-dioxide-based materials can provide a reliable gate dielectric, even to a thickness of 1 nm, and that CMOS scaling may well be viable to the 50-nm-technology node using ...
Recently the combined benefits of the tri-gate CMOS transistor architecture with strained-silicon channels, high-K gate dielectric, metal-gate electrode, and dual epitaxially grown raised source ...
Conference Call and Webcast Rigetti will host a conference call later today, November 12, 2024, at 8:30 a.m. ET, or 5:30 a.m. PT, to discuss its third quarter 2024 financial results.
Technology Demonstrator The TC4SoC was designed to demonstrate the major features of a state of the art nanometer (90nm) CMOS technology and the design system required integrate these features. The ...